Coating Films of Titanium Nitride Prepared by Ion and Vapor Deposition Method
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1985-06-20
著者
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SATOU Mamoru
Government Industrial Research Institute
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Fujimoto Fuminori
College of General Education, University of Tokyo
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Satou Mamoru
Government Industrial Research Institute Osaka
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Satou Mamoru
Goverment Industrial Research Institute
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Ogata Kiyoshi
Government Industrial Research Institute Osaka
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ANDOH Yasunori
Government Industrial Research Institute, Osaka
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SUZUKI Yasuo
Government Industrial Research Institute, Osaka
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MATSUDA Koji
Government Industrial Research Institute, Osaka
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Fujimoto Fuminori
College Of General Education University Of Tokyo
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Andoh Yasunori
Government Industrial Research Institute Osaka
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Matsuda Koji
Government Industrial Research Institute Osaka
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Suzuki Yasuo
Government Industrial Research Institute Osaka
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FUJIMOTO Fuminori
College of Arts and Sciences, University of Tokyo:(Present address)Institute of Scientific and Industrial Research, Osaka University
関連論文
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- Three-Dimensional Analysis of Locally Implanted Atoms by MeV Helium Ion Microprobe
- Au^+-Ion-Implanted Silica Glass with Non-Linear Optical Property
- Etching Rate Control by MeV O^+ Implantation for Laser-Chemical Reaction of Ferrite : Beam-Induced Physics and Chemistry
- Local Control of Magnetic Property in Stainless Steel Surface by Ion and Laser Beams : Beam-Induced Physics and Chemistry
- Local Control of Magnetic Property in Stainless Steel Surface by Ion and Laser Beams
- Etching Rate Control by MeV O^+ Implantation for Laser-Chemical Reaction of Ferrite
- Preferentially Oriented Crystal Growth in Dynamic Mixing Process : An Approach by Monte Carlo Simulation
- Focused High-Energy Heavy Ion Beams
- Surface Structure of Ion-Implanted Silica Glass
- Tomography of Microstructures by Scanning Micro-RBS Probe
- Optimization in Spot Sizes of Focused MeV Ion Beam by Precise Adjustment of Lens-Current Excitations : Nuclear Science, Plasmas and Electric Discharges
- Titanium Nitride Crystal Growth with Preferred Orientation by Dynamic Mixing Method
- Hydrogen Content in a-SiC:H Films Prepared by Plasma Decomposition of Silane and Methane or Ethylene
- Detection of Adsorbed Hydrogen on W(001) by Using ^1H(^N,αν)^C Reaction
- Sputtering Yields of Si and Ni from the Ni_Si_x System Studied by Rutherford Backscattering Spectrometry
- Origin of Si(LMM) Auger Electron Emission from Silicon and Si-Alloys by keV Ar^+ Ion Bombardment
- On "Lattice Image" in Electron Micrographs
- Channeling Radiation from 1 MeV Electrons
- Effect of Higher-Order Spherical Aberration Term on Transfer Function in Electron Microscopy
- Coating Films of Titanium Nitride Prepared by Ion and Vapor Deposition Method
- Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam Bombardment
- Synthesis of Titanium Oxide by Dynamic Ion Beam Mixing(Materials, Metallurgy & Weldability)
- Dynamic Mixing Experiment for Oxide Film Formation with ECR Ion Beam(Physics, Process, Instrument & Measurement)
- Measurements of Beam-Foil Spectra of Highly Ionized Chlorine Ions in the Region of 170-260 A^^○
- Projectile Dependence of KL^l Vacancy Production Cross Sections of Al by H and He Ion Bombardments
- Single and Double K-Shell Ionization Cross Sections of Beryllium by C,N,O and Ne Ion Bombardments
- Stopping Cross-Sections of Rare Gases in Amorphous Silicon for MeV Energy Helium Ions
- Plasma Oscillations Excited by a Fast Electron in a Metallic Particle
- Calculation of s Shadow Cone Formed by Scattering of an Ion Beam from an Atom
- Moire^' Fringes Due to Triple Lamellae of Polyethylene Crystals
- Some Observations in Energy Loss Spectrum of Silver
- Surface Plasma Oscillation in Aluminum Fine Particles
- Study of the Surface Plasmon in a Thin Copper Film by an Electron Energy Analyser with High Resolution
- CONSTRUCTION OF ANGLE RESOLVED ULTRAVIOLENT PHOTOELECTRON SPECTROMETER AND ITS APPLICATION TO THE ANALYSIS OF Si(lll) SURFACE
- Inelastic Scattering of Fast Electrons by Thin Crystals
- On "Lattice Image" in Electron Micrographs