Growth of Cubic Boron Nitride Films by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition (<Special Issue> Plasma Processing)
スポンサーリンク
概要
- 論文の詳細を見る
Cubic boron nitride (c-BN) films were deposited on silicon (100) wafer substrates from the B_2H_6+N_2+He+Ar system at pressures ranging from 5×10^<-4>-2×10^<-3> Torr by low-pressure inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD). The substrate bias was controlled by varying auxiliary rf power to the substrate. The effects of the process parameters such as substrate bias and working pressure on the c-BN growth have mainly been investigated. The results are discussed in relation to the plasma diagnostics by electric probe and optical emission spectroscopy.
- 社団法人応用物理学会の論文
- 1994-07-30
著者
-
Ichiki Takanori
Department Of Electric And Electronic Engineering Toyo University
-
Ichiki Takanori
Department Of Metallurgy And Materials Science Faculty Of Engineering The University Of Tokyo
-
YOSHIDA Toyonobu
Department of Materials Engineering, School of Engineering, The University of Tokyo
-
Yoshida Toyonobu
Department Of Metallurgy And Materials Science Faculty Of Engineering University Of Tokyo
-
Yoshida Toyonobu
Department Of Metallurgy And Materials Science Faculty Of Engineering The University Of Tokyo
-
Yoshida Toyonobu
Department Of Materials Engineering School Of Engineering The University Of Tokyo
-
Ichiki Takanori
Department of Bioengineering, Graduate School of Engineering, The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
関連論文
- Gap-filling of Cu Employing Sustained Self-Sputtering with Inductively Coupled Plasma Ionization
- Development and Plasma Characteristics Measurement of Planar-Type Magnetic Neutral Loop Discharge Etcher
- SiO_2 Etching Employing Inductively Coupled Plasma with Hot Inner Wall
- Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma
- Fabrication of Quartz Microcapillary Electrophoresis Chips Using Plasma Etching
- Gap-Filling of Cu Employing Self-Sustained Sputtering with ICP Ionization
- A New Inside-Type Segmented Coil Antenna for Uniformity Control in a Large-Area Inductively Coupled Plasma
- Microintaglio Printing of Biomolecules and Its Application to In situ Production of Messenger Ribonucleic Acid Display Microarray
- Preparation of Cubic Boron Nitride Films by RF Sputtering
- Healthcare Chip for Checking Health Condition from Analysis of Trace Blood Collected by Painless Needle
- Dry Cleaning Technology for Removal of Silicon Native Oxide Employing Hot NH_3/NF_3 Exposure
- Transmission Electron Microscopic Studies of LiNb_Ta_O_3 Films Deposited on Sapphire Substrates by Thermal Plasma Spray CVD (Microstructure of LiNb_Ta_O_3 Films Deposited by Thermal Plasma Spray CVD)
- Growth of Cubic Boron Nitride Films by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition ( Plasma Processing)
- Etching Reactivity of Negative Ions Generated in Cl2 Downstream Plasma
- On-Chip Evaluation of Damage on Cell Surfaces Induced by Cell Dissociation Agents
- Application of On-Chip Electrophoresis of Cell to Evaluation of Cell Cycle Stages of HL-60 Cells
- Electrical Properties of Thick Epitaxial Silicon Films Deposited at High Rates and Low Temperatures by Mesoplasma Chemical Vapor Deposition
- Novel Microfluidic Valve Technology Based on Shape Memory Effect of Poly(\varepsilon-caprolactone)
- Microintaglio Printing of In situ Synthesized Proteins Enables Rapid Printing of High-Density Protein Microarrays Directly from DNA Microarrays
- Cavity Ring-Down Spectroscopy Measurement of H(n=2) Density in Mesoplasma for Fast-Rate Silicon Epitaxy
- Electrokinetic Evaluation of Individual Exosomes by On-Chip Microcapillary Electrophoresis with Laser Dark-Field Microscopy
- Novel Microfluidic Valve Technology Based on Shape Memory Effect of Poly(ε-caprolactone)
- Microintaglio Printing of In situ Synthesized Proteins Enables Rapid Printing of High-Density Protein Microarrays Directly from DNA Microarrays
- Development of Porous YSZ Coatings with Modified Thermal and Optical Properties by Plasma Spray Physical Vapor Deposition
- Electrokinetic Evaluation of Individual Exosomes by On-Chip Microcapillary Electrophoresis with Laser Dark-Field Microscopy
- Novel Microfluidic Valve Technology Based on Shape Memory Effect of Poly (ε-caprolactone)