Electron-Beam-Induced Refractive-Index Change of Amorphous Semiconductors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1975-07-05
著者
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Koyama Jiro
Department Of Electronics Faculty Of Engineering Osaka University
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SUHARA Toshiaki
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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NISHIHARA Hiroshi
Department of Electronic Engineering, Graduate School of Engineering, Osaka University
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Koyama Jiro
Department Of Cardiovascular Medicine Tohoku University Graduate School Of Medicine
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Suhara Toshiaki
Department Of Electronics Faculty Of Engineering Osaka University
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Suhara Toshiaki
Department Of Elect Ronics Graduate School Of Engineering Osaka University
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Nishihara Hiroshi
Department Of Electronics Faculty Of Engineering Osaka University
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Nishihara Hiroshi
Department Of Chemistry School Of Science The University Of Tokyo
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Nishihara Hiroshi
Department Of Chemistry Faculty Of Science And Technology Keio University
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