2. アブレーションプラズマを用いた材料開発 (<小特集>アブレーションプラズマのプロセス応用)

概要

論文の詳細を見る
Ablation plasma, formed by irradiation of targets with pulsed laser light, is an attractive plasma source for fabricating materials. Silicon nanoparticles with quantum confinement effects can be cleanly fabricated from ablation plasma. Because ablation plasma is formed instantaneously, it allows fabrication of structured Si nanoparticles using sequential pulsed processes. In order to dope functional impurities and to terminate surface states with pulsed gas, we have investigated the dynamical formation process of Si nanoparticles. We directly observed the growth process of Si nanoparticles on a time scale of 1 ms. Using ablation plasma, we fabricated Er-doped nano-structured Si-based films with 1.5 μm light emission at room temperature. Thus, we demonstrated a new capability of ablation plasma for fabricating structured Si nanoparticles.
社団法人プラズマ・核融合学会の論文
2000-11-25