Si_3N_4メンブレンマスクを用いた強磁性体微細構造の作製

概要

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Spin-polarized scanning tunneling microscopy (SP-STM) is a promising technique for atomically resolved surface magnetic structure imaging. Since SP-STM is a surface-sensitive technique, the sample to be observed, such as a magnctic nanostructure, is required to have a well-defined clean surface. The magnetic sample preparation technique presented in this paper makes it easy to fabricate magnetic nanostructures in a vacuum. An Si_3N_4 membrane with submicron holes was used as a shadow mask for thin-film deposition. Conventional silicone processes were employed to make the Si_3N_4 membrane, and the shadow mask holes were formed on it using focused ion beam etching. The usability of this shadow mask was demonstrated by forming Co thin-film nanostructures on an Si substrate through the mask. The nanostructures were characterized by atomic force microscopy and magnetic force microscopy.
2001-02-01