K-0702 TiN薄膜の膜特性におよぼすスパッタリング成膜条件の影響(S07-1 薄膜の創製と評価)(S07 表面改質とその機能特性評価)

概要

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A study on the effect of discharge current and negative bias voltage on the characteristics of TiN films deposited on carbon steel S45C by reactive magnetron sputtering method was carried out. As the characteristics, hardness, adhesive strength, fracture toughness, and residual stress were examined. With increasing discharge current or bias voltage, the hardness increased, but the adhesive strength decreased. Fracture toughness estimated by IF method decreased with increasing bias voltage. Quite large compressive residual stress was evaluated by X-ray method, and the residual stress increased as the discharge current or bias voltage increased. It was found that hardness, adhesive strength, and fracture toughness had a good correlation with the residual stress.
一般社団法人日本機械学会の論文
2001-08-22