DCマグネトロンスパッタリングにより作製したTiN薄膜の機械的特性に及ぼす成膜ガス圧の影響

概要

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Residual stress, hardness, toughness and adhesive strength of TiN coatings deposited on carbon steel S45C by DC magnetron sputtering under three sputtering gas pressures 0.5 Pa, 0.8 Pa and 1.76 Pa were investigated. The residual stress once increased and then dehreased with increasing bias voltage at 0.5 Pa and 0.8 Pa, but increased monotonously at 1.76 Pa. Comparing at relatively low bias voltage, it increased with decreasing gas pressure. These residual stresses were considered to be generated by bombardment with high-energy ions during the coating process, and these variations could be explained by the difference of bombarding energy at each gas pressure. The variations of hardness and toughness with increasing bias voltage at each gas pressure correlated with the variation in residual stress at corresponding gas pressure. Increasing bias voltage, the adhesive strength decreased at 1.76 Pa, increased at 0.5 Pa, once decreased and then increased at 0.8 Pa. The qualitative tendency of its variation also could be explained by the difference of bomgarding energy at each gas pressure.
2004-04-25