201 DC マグネトロンスパッタリング法により作製した TiN 薄膜の機械的特性に及ぼす成膜ガス圧力の影響

概要

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The effects of sputtering gas pressure on the relationship between bias voltage and the mechanical properties, residual stress, hardness, toughness and adhesive strength of TiN films deposited on carbon steel S45C by D.C. magnetron sputtering was investigated. The residual stress once increased and then decreased with increasing bias voltage at relatively low gas pressure 0.5Pa and 0.8Pa, but increased monotonously at higher gas pressure 1.76Pa. The adhesive strength decreased with increasing bias voltage at gas pressure 0.5Pa, but increased with increasing bias voltage at 1.76Pa. The both changes of hardness and toughness could be related directly to residual stress, irrespective of the value of the bias voltage and the gas pressure, but the variation of adhesive strength could not explain only by the residual stress. In order to explain it, it should be necessary to take the increasing of the adhesive strength by the mixing between sputtered particles and the substrate surface promoted at lower gas pressure into consideration.
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