426 TiN薄膜の膜特性におよぼすスパッタリング成膜条件の影響(WS-1 マイクロデバイスの加工と材料評価)

概要

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A study on the effect of discharge current and bias voltage on the characteristics of TiN films deposited on carbon steel S45C by magnetron sputtering method was carried out. As the characteristics, hardness, adhesive strength, residual stress, and length of crack generated by indentation of Vickers indenter (IF method) were examined in this study. With increasing discharge current or bias voltage, the hardness increased, but the adhesive strength decreased. Quite large compressive residual stress was evaluated by X-ray method, and the residual stress also increased as the discharge current or bias voltage increased. The crack length obtained by IF method decreased with increasing bias voltage, but did not depend on discharge current.
一般社団法人日本機械学会の論文
2001-03-16