工業用純チタン試験片に形成させたTiNおよびAlNスパッタ薄膜の割れ強度およびはく離強度評価

概要

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Titanium nitride (TiN) and aluminum nitride (AlN) films of 1∿26μm thickness were deposited on pure titanium specimens by reactive RF magnetron sputtering method. Tensile tests were carried out for the specimens to evaluate the fracture strength of films and the interfacial fracture toughness between film and substrate. With increasing load the film was cracked repeatedly, and the partial delamination of the film started under the plastic deformation of substrate. The fracture strength of films σ_c were determined by the extrapolation method using the relationship between inverse of crack intervals and tensile stress of substrate. The σ_c of TiN and AlN films was almost the same irrespective of film thickness, but the σ_c of AlN film was small when the film thickness was 26μm. The interfacial fracture toughness G_c12 of both films increased with increasing film thickness, and the G_c12 of TiN film was larger than that of AlN film at the same film thickness.
社団法人日本材料学会の論文
2001-12-15