直流反応性マグネトロンスパッタリング法で作製したSiO_x:OH/TiO_2多層薄膜の光励起親水化特性

概要

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SiO_x:OH films containing a high concentration of Si-OH bonds deposited by using a direct current (DC) reactive magnetron sputtering with added H_2O. We have discussed the photocatalytic characteristics of SiO_x:OH/TiO_2 multi-layer films, in which various SiO_x:OH films were deposited onto photocatalytic TiO_2 films. As a result, ultra-hydrophilic properties were observed under ultraviolet (UV) irradiation of 10μW/cm^2. The concentration of hydrogen in the SiO_x:OH films could be controlled by changing the pressure of H_2O that was used during the process. The hydrogen in the layers is believed to take the form of either Si-OH or H_2O bonds; however, the Si-OH bonding dominates. The hydrophilic properties of the layers are considered to be improved by the presence of the -OH groups in the SiO_x:OH film.
2005-09-01