Scaling Studies on RF Plugging Potential in the Cusp-Anchored Mirror Device,RFC-XX-M

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概要

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• A scaling relation for the RF plugging potential is investigated in the line cuspplasma of a cusp-anchored mirror device, RFC-XX-M. The RF plugging potential ismeasured by two independent methods: One is measured by multi-grid energyanalyzers and the other is deduced from the measured ion density under RF electrodesand the ion energy distribution in terms of the Boltzmann relation. These values agreewell each other. The scaling relations of the RF plugging potential for an applied RFfield and an ion density are investigated. These are compared with theoretical calcula-lions. The RF plugging potential is formed under RF electrodes by the enhanced RFelectric field associated with an eigenmode of the ion Bernstein wave with a perpendicular mode number, n = l and is in accordance with the ponderomotive potential expression.[RF plugging, open-ended system, ponderomotive potential, Ton cyclotron fre- ]l quency, sheet plasma, line cusp, ion Bernstein wave.l

• 社団法人日本物理学会の論文
• 1988-03-15

著者

• 高橋 昭彦

  Kyushu Univ. Fukuoka Jpn

• Kawamoto Tohru

  Nanotechnology Research Institute (nri) And Research Consortium For Synthetic Nano-function Material

• Garner Harold

  Ga Technologies Inc.

• Aoki Takashi

  School Of Health Sciences Kyushu University

• MASUMOTO Hiroshi

  Institute for Materials Research, Tohoku University

• AOKI Takashi

  Institute of Space and Astronautical Science

• Kumazawa Ryuhei

  Institute Of Plasma Physics Nagoya University

• Nishimura K

  Institute Of Plasma Physics Nagoya University

• Nishimura Kiyohiko

  Institute Of Plasma Physics Nagoya University

• ADATI Keizo

  Institute of Plasma Physics,Nagoya University

• FUJITA Hideki

  Institute of Plasma Physics,Nagoya University

• HIDEKUMA Shigeru

  Institute of Plasma Physics,Nagoya University

• KAWAMOTO Toshikazu

  Institute of Plasma Physics,Nagoya University

• OKAMURA Shoichi

  Institute of Plasma Physics,Nagoya University

• SATO Teruyuki

  Institute of Plasma Physics,Nagoya University

• HATORI Tadatsugu

  Institute of Plasma Physics,Nagoya University

• R.GARNER Harold

  GA Technologies Inc.

• M.HOWALD Arthur

  GA Technologies Inc.

• J.LEIKIND Bernard

  GA Technologies Inc.

• Hatori Tadatsugu

  Institute Of Plasma Physics Nagoya University

• Fujita Hideki

  Institute Of Plasma Physics Nagoya University

• Howald Arthur

  Ga Technologies Inc.

• Adati Keizo

  Institute Of Plasma Physics Nagoya University

• Hidekuma Shigeru

  Institute Of Plasma Physics Nagoya University

• Sato Teruyuki

  Institute Of Plasma Physics Nagoya University

• Okamura Shoichi

  Institute Of Plasma Physics Nagoya University

• Masumoto Hiroshi

  Institute For Materials Research Tohoku University

• Kawamoto T

  Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti

• Masumoto Hiroshi

  Institute Of Plasma Physics Nagoya University

• Masumoto Hiroshi

  Institut Fur Physiologische Chemie I Heinrich-heine-universitat Dusseldorf

• Aoki T

  School Of Medicine Juntendo University

• Aoi Tatsufumi

  Department Of Engineering Kyushu University

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