R.GARNER Harold | GA Technologies Inc.
スポンサーリンク
概要
関連著者
-
Garner Harold
Ga Technologies Inc.
-
Kumazawa Ryuhei
Institute Of Plasma Physics Nagoya University
-
Nishimura K
Institute Of Plasma Physics Nagoya University
-
Nishimura Kiyohiko
Institute Of Plasma Physics Nagoya University
-
ADATI Keizo
Institute of Plasma Physics,Nagoya University
-
FUJITA Hideki
Institute of Plasma Physics,Nagoya University
-
OKAMURA Shoichi
Institute of Plasma Physics,Nagoya University
-
SATO Teruyuki
Institute of Plasma Physics,Nagoya University
-
R.GARNER Harold
GA Technologies Inc.
-
M.HOWALD Arthur
GA Technologies Inc.
-
Fujita Hideki
Institute Of Plasma Physics Nagoya University
-
Howald Arthur
Ga Technologies Inc.
-
Adati Keizo
Institute Of Plasma Physics Nagoya University
-
Sato Teruyuki
Institute Of Plasma Physics Nagoya University
-
Okamura Shoichi
Institute Of Plasma Physics Nagoya University
-
高橋 昭彦
Kyushu Univ. Fukuoka Jpn
-
Kawamoto Tohru
Nanotechnology Research Institute (nri) And Research Consortium For Synthetic Nano-function Material
-
Aoki Takashi
School Of Health Sciences Kyushu University
-
MASUMOTO Hiroshi
Institute for Materials Research, Tohoku University
-
AOKI Takashi
Institute of Space and Astronautical Science
-
HIDEKUMA Shigeru
Institute of Plasma Physics,Nagoya University
-
KAWAMOTO Toshikazu
Institute of Plasma Physics,Nagoya University
-
HATORI Tadatsugu
Institute of Plasma Physics,Nagoya University
-
J.LEIKIND Bernard
GA Technologies Inc.
-
Hatori Tadatsugu
Institute Of Plasma Physics Nagoya University
-
Hidekuma Shigeru
Institute Of Plasma Physics Nagoya University
-
Masumoto Hiroshi
Institute For Materials Research Tohoku University
-
Kawamoto T
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
-
Masumoto Hiroshi
Institute Of Plasma Physics Nagoya University
-
Masumoto Hiroshi
Institut Fur Physiologische Chemie I Heinrich-heine-universitat Dusseldorf
-
Aoki T
School Of Medicine Juntendo University
-
Aoi Tatsufumi
Department Of Engineering Kyushu University
著作論文
- Scaling Studies on RF Plugging Potential in the Cusp-Anchored Mirror Device,RFC-XX-M
- Potential Formation in the Plasma Confinement Region of a Radio-Frequency Plugged Linear Device