PVD コーティング手法による (011)〔100〕方位の珪素鋼単結晶上に TiN を成膜したときの集合組織の変化

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In order to clarify the difference in the textures of TiN film due to PVD coating methods, TiN ceramic coating by HCD (Hollow Cathode Discharge) and EB (Electron Beam)+RF (Radio Frequency) methods was done on the surface of polished silicon steel samples. Pole figures of dual textures of the TiN film and related silicon steel samples were measured simultaneously using SSD (Soild State Detector) auto pole figure apparatus. (111)_<TIN> pole figure of TiN film done by the HCD method showed the dominant texture of (11^^-1)[110] orientation, and (100)_<Sl-steel> pole figure of (011)[100] single crystal of silicon steel showed the dominant texture of (011)[100] orientation, in which two (220)_<TIN> pole peaks of TiN film on TD axis were detected simultaneously, and their conjugated pole peaks manifested elliptical shape. In contrast, (111)_TIN pole figure of TiN film done by the EB+RF method showed the weak texture of (111) crystallographic plane, and (100)_<Sl-steel> of silicon steel sheet showed the dominant texture of (011)[100] orientation, in which (220)_<TIN> pole peaks of TiN film were detected simultaneously, and their conjugated pole peaks also manifested elliptical shape. It is considered that, due to the higher ionization lby the HCD method than that by EB+RF, it was possible for TiN film to form the dominant texture of (11^^-1)[110] orientation, resulting in a fine and smooth TiN film with good adhesion, thereby endowing the TiN-coated silicon steel sheet with a reduced iron loss.
社団法人日本鉄鋼協会の論文
1996-10-01

PVD コーティング手法による (011)〔100〕方位の珪素鋼単結晶上に TiN を成膜したときの集合組織の変化

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