珪素鋼単結晶表面におけるプラズマコーティング初期段階のTiN,TiCNおよびTiC薄膜の集合組織

概要

論文の詳細を見る
The texture formation of very thin (0.05μm) TiN, TiCN and TiC films at the incipient stage during plasma coating of (011)[100] single crystals of silicon steel was investigated using the electron back scattering diffraction (EBSD) method, and that of 1.0μm was measured using the solid state detector (SSD) auto pole figure apparatus. These ceramic films were also measured using the grow discharge spectroscopy (GDS). The orientation of very thin TiN film parallel to the normal direction (ND) exhibited separate (111) and (100) colonies of about 20-30μm areas with low angles, whereas that to the rolling direction (RD) also exhibited separate <111> and <110> colonies. In contrast, the orientation of very thin TiCN and TiC films parallel to the ND and the RD was randam as evidenced by the black color areas which detected no orientation and high angles due to the existence of large strain etc. Black color area of TiC was larger than that of TiCN. 1.0μm thick TiN film exhibited a high {111} pole intensity and a good misfit, whereas TiCN and TiC films exhibited weaker {111} pole intensities and poor misfits in the order of TiCN, TiC. It should be noted that the smaller misfits of ceramic films and single crystals of silicon steel makes colonies coherent to the ND or the RD orientation at the incipient stage during plasma coating.
社団法人日本鉄鋼協会の論文