飛行時間型質量分析法による表面微量分析技術の開発

概要

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Abstract According as element densities in electronic circuit have become extremely high in recent years, it is important to understand the information about surfaces and interfaces of materials. Then, systems having topography and composition analyses are required. In this research, we tried to build a compact and low price surface microanalysis system using laser ablation ionization and time of flight mass spectrometer (TOF-MS). The mass resolution of the produced equipment was two or less in mass-to-charge ratio. The minimum volume of mass for detection was 3.3pg. We measured species and ablation threshold from natural silicon wafer and silica glass. Based on the results, we explained the thermal dissociation mechanisms of silicon wafer with the oxide film. We performed quantitative analysis for 4% BF2+ doped silicon wafer and could determine the B+ composition.
宮崎大学の論文