Thermally Stable Carbon-Doped Silicon Oxide Films Deposited at Room Temperature
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概要
- 論文の詳細を見る
- 2006-09-13
著者
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KATO Hideaki
Division of Physics, Graduate School of Science, Hokkaido University
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Terai Yoshikazu
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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FUJIWARA Yasufumi
Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University
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Yoshizako Yuji
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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YAMAOKA Keisuke
Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University
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TSUKIYAMA Daisuke
Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University
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Yamaoka Keisuke
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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Tsukiyama Daisuke
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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Kato Hideaki
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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Fujiwara Yasufumi
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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