Precise Control of SiO_2 Etching Characteristics Using Mono-Layer Adsorption of HF/H_2O Vapor
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Kobayashi Nobuyoshi
Semiconductor & Integrated Circuits Div. Hitachi Ltd.
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Nakanishi Naruhiko
Semiconductor Development Center Semiconductor & Integrated Circuits Div. Hitachi Ltd.
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Kobayashi Nobuyoshi
Semiconductor Development Center Semiconductor & Integrated Circuits Div. Hitachi Ltd.
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