自己バイアス電流導入高周波グロー放電発光分析法による鋼中微量Cu, Ni, Ti, Bの定量(分析・解析)

概要

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In an r.f. glow-discharge plasma, a d.c. bias current can be introduced by connecting an electric circuit comprising a low-pass filter and a variable resistor. The bias current promotes the emission excitations in the plasma, leading to an improvement of the detection power in the optical emission spectrometry. By conducting a bias current of 27mA, the emission intensities of atomic resonance lines were several times larger than those obtained with conventional r.f.-powered plasmas. The detection limits for determination of alloyed elements in Fe-based low alloyed standard samples were estimated to be 3ppm Cu for Cu I 324.75nm, 10ppm Ni for Ni I 352.45nm, 6ppm Ti for Ti I 364.267nm, and 7ppm B for B I 208.96nm.
社団法人日本鉄鋼協会の論文
2005-05-01