Smooth and Vertical Etching of GaAs/GaInP/AlGaInP Using Inductively Coupled Cl_2/BCl_3/CH_4 Plasma
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-12-15
著者
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Luo Yi
State Key Laboratory On Integrated Optoelectronics Tsinghua National Laboratory For Information Scie
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Luo Yi
National Integrated Optoelectronics Laboratory Department Of Electronic Engineering Tsinghua Univers
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Luo Yi
University Of Pennsylvania School Of Veterinary Medicine Department Of Clinical Studies
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Luo Yi
State Key Lab On Integrated Optoelectronics Department Of Electronic Engineering Tsinghua University
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Xiong Bing
State Key Laboratory On Integrated Optoelectronics Tsinghua National Laboratory For Information Scie
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SUN Changzheng
State Key Lab of Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua Universi
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HAO Zhibiao
State Key Laboratory on Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua U
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HAN Shuo
State Key Laboratory on Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua U
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REN Fan
State Key Laboratory on Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua U
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Ren Fan
State Key Laboratory On Integrated Optoelectronics Department Of Electronic Engineering Tsinghua Uni
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Han Shuo
State Key Laboratory On Integrated Optoelectronics Department Of Electronic Engineering Tsinghua Uni
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Hao Zhibiao
State Key Laboratory On Integrated Optoelectronics Department Of Electronic Engineering Tsinghua Uni
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Sun C
State Key Laboratory On Integrated Optoelectronics Tsinghua National Laboratory For Information Scie
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HAN Shuo
State Key Laboratory of Crystal Materials, Shandong University
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Luo Yi
State Key Lab of Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua University
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Xiong Bing
State Key Lab of Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua University
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