Emission Characteristics of Extreme Ultraviolet Radiation from CO2 Laser-Produced Xenon Plasma
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概要
- 論文の詳細を見る
We propose a CO2 laser-produced plasma as the extreme ultraviolet (EUV) light source for a future optical lithography system. The EUV radiation around 13.5 nm was generated by focusing the laser beam from a transversely-excited atmospheric CO2 laser (4 J, 50 ns full width at half-maximum (FWHM)) on a Xe gas target and a Xe cryogenic target. The EUV energy was measured by a Flying Circus II detecting system, and an output energy of more than 3 mJ/pulse and an conversion efficiency of more than 0.1% per $2\pi$ sr at 13.5 nm were obtained. These values are comparable to those of Nd:YAG laser-produced plasma, indicating the potential scalability of the EUV light source using a CO2 laser produced plasma.
- Japan Society of Applied Physicsの論文
- 2004-04-15
著者
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TAKAHASHI Akihiko
Department of Cardiology, Sakurakai Takahashi Hospital
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TANAKA Hiroki
Department of Applied Physics, University of Miyazaki
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OKADA Tatsuo
Department of Electrical Engineering, Faculty of Engineering, Kyushu University
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Okada Tatsuo
Department Of Electrical And Electronic Systems Engineering Graduate School Of Information Science A
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Takahashi A
Department Of Health Sciences School Of Medicine Kyushu University
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Akinaga Koji
Department of Electrical and Electronic Systems Engineering, Graduate School of Information Science
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Takahashi Akihiko
Department Of Cardiology Sakurakai Takahashi Hospital
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Okada Tatsuo
Department Of Electrical And Electronic Systems Engineering Graduate School Of Information Science A
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Tanaka H
Department Of Electrical And Electronic Systems Engineering Graduate School Of Information Science A
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Tanaka Hiroki
Department Of Applied Physics University Of Miyazaki
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Akinaga Koji
Department Of Electrical And Electronic Systems Engineering Graduate School Of Information Science A
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