Extension of HRTEM resolution by semi-blind deconvolution method and Gerchberg-Saxton algorithm : application to grain boundary and interface
スポンサーリンク
概要
- 論文の詳細を見る
- Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
- 2001-11-13
著者
-
Kai J‐j
National Tsing‐hua Univ. Hsinchu Twn
-
Chen F‐r
National Tsing‐hua Univ. Hsinchu Twn
-
Chen Fu-rong
Department Of Engineering And System Science National Tsing-hua University
-
Chang Li
Department Of Materials Science And Engineering National Chiao-tung University Hsinchu
-
Chang Li
Department Of Chemical Engineering National Cheng Kung University
-
Ichinose Hideki
Department Of Materials Science Faculty Of Engineering The University Of Tokyo
-
Kai Ji-jung
Department Of Engineering And System Science Center For Electron Microscopy National Tsing-hua Unive
-
Ichinose Hideki
Department Of Materials Science And Engineering Tokyo University
-
Chen Fu-rong
Department Of Engineering And System Science Center For Electron Microscopy National Tsing-hua Unive
関連論文
- Sublattice Reversal in GaAs/Si/GaAs (100) Heterostructures by Molecular Beam Epitaxy
- Solid-State NMR Characterization on the Molecular-Level Homogeneity in Lower Critical Solution Temparature Mixtures of Poly(α-methyl styrene) and Poly(2,6-dimethyl-ρ-phenylene oxide)
- Comparison of Miscibility and Morphology in Two Ternary Blend Systems : Effects of Binary Interactions
- Effect of Hot Isostatic Pressing on Microstructure and Mechanical Properties of CM-681LC Nickel-Base Superalloy Using Microcast
- Structural Disorder and Optical Property of InGaAsN Alloy Semiconductor (小特集テーマ 進展する窒化物半導体光・電子デバイスの現状,及び一般)
- Structural Disorder and Optical Property of InGaAsN Alloy Semiconductor (小特集テーマ:進展する窒化物半導体光・電子デバイスの現状,及び一般)
- Discussion on the Mechanical Behavior of Carbon Nanotube/C60 Composite Based on Observation of Interfacial Structure
- Processing of Ductile Carbon Nanotube/C60 Composite
- Low-Voltage-Operation High-Power-Density AlGaAs/InGaAs Enhancement-Mode Pseudomorphic High-Electron-Mobility Transistor for Personal Handy-Phone Handset Application : Semiconductors
- GaAs/Ge/GaAs Sublattice Reversal Epitaxy on GaAs (100) and (111) Substrates for Nonlinear Optical Devices
- The fabrication and application of Zernike electrostatic phase plate
- Imaging of a single atomic column in silicon grain boundary
- Growth of Semipolar InN($10\bar{1}3$) on LaAlO3(112) Substrate
- Bandgap mapping for III-V quantum well by electron spectroscopy imaging
- Development of a haptic sensor for measuring skin morphological features
- Structure modelling of Σ3 and Σ9 coincident boundaries in CVD diamond thin films
- Transmission Electron Microscopic Observation of Grain Boundaries in CVD Diamond Thin Films
- Miscibility, Morphology, and Thermal Characterization of an Acrylic/Styrenic Blend System. Poly(cyclohexyl methacrylate) and Poly (α-methyl styrene)
- Four-dimensional dielectric property image obtained from electron spectroscopic imaging series
- Extension of HRTEM resolution by semi-blind deconvolution method and Gerchberg-Saxton algorithm : application to grain boundary and interface
- Mapping of sp^2/sp^3 in DLC thin film by signal processed ESI series energy-loss image
- Atomic structure observation of silicon carbide using HRTEM
- Atomic structure observation of silicon carbide using HRTEM
- Chemical Precursor for the Synthesis of Diamond Films at Low Temperature
- ARHVTEM of the Pd/ZnO heterointerface chemical structure
- A Modified Wheeler Model to Improve Predictions of Crack Growth Following a Single Overload
- Electron Emission Properties of Nitrogen-Induced Localized Defects in InAsN/GaAs Quantum Dots
- Study of Titanium Tungsten Nitride and Tungsten Nitride Schottky Contacts on n-GaN
- Mechanism of Microstructure Evolution for the Cu/Ta/GaAs Structure after Thermal Annealing
- Effect of Growth Temperature on Formation of Amorphous Nitride Interlayer between AlN and Si(111)
- Effect of Growth Temperature on Formation of Amorphous Nitride Interlayer between AlN and Si(111) (Special Issue : Recent Advances in Nitride Semiconductors)