Chemical Precursor for the Synthesis of Diamond Films at Low Temperature
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概要
- 論文の詳細を見る
In this study, diamond films have been synthesized on adamantane-coated (100) Si substrates at 530 °C by microwave plasma chemical vapor deposition from a gaseous mixture of methane and hydrogen. Scanning electron microscopy, Raman spectroscopy, and X-ray diffraction were employed to characterize the carbon chemical species on the Si substrate from adamantane into diamond. These measurements provide definitive evidence for formation of high-crystalline diamond film on Si substrate without any other pretreatments. Moreover, the possible mechanisms for the diamond formation are presented.
- Japan Society of Applied Physicsの論文
- 2010-04-25
著者
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Tiwari Rajanish
Department Of Materials Science And Engineering National Chiao Tung University
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Chang Li
Department Of Chemical Engineering National Cheng Kung University
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Chang Li
Department Of Materials Science And Engineering National Chiao Tung University
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