Effect of Growth Temperature on Formation of Amorphous Nitride Interlayer between AlN and Si(111) (Special Issue : Recent Advances in Nitride Semiconductors)
スポンサーリンク
概要
著者
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Chang Li
Department Of Chemical Engineering National Cheng Kung University
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Chen Yu-chang
Department Of Chemical Engineering National Taiwan Institute Of Technology
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Lin Pei-Yin
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan
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Chen Jr-Yu
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan
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- Effect of Growth Temperature on Formation of Amorphous Nitride Interlayer between AlN and Si(111)
- Effect of Growth Temperature on Formation of Amorphous Nitride Interlayer between AlN and Si(111) (Special Issue : Recent Advances in Nitride Semiconductors)