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- Electroplated Reflection Masks for Soft X-Ray Projection Lithography
- Resist Performance in 5 nm Soft X-Ray Projection Lithography
- Reduction Imaging at 4.5 nm with Schwarzschild Optics
- Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
- Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
- Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers
- The Near-Field Super-Resolution Properties of an Antimony Thin Film
- Thermal Lithography for 100-nm Dimensions Using a Nano-Heat Spot of a Visible Laser Beam : Instrumentation, Measurement, and Fabrication Technology
- Analysis of Deformation of X-Ray Mask Membrane in Aligner Motion
- Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure
- High-Speed Optical Near-Field Photolithography by Super Resolution Near-Field Structure
- Improvement of Super-RENS MO Disk Characteristics by Optimized Super-Resolution Near-Field Structure
- Super-Resolution Readout Using a Silver Scattering Center with Plasmon Excitation Generated in a Non-Magnetic Readout Layer
- Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure
- The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS)
- Oxygen Doping Effects on Super-resolution Scattering-mode Near-field Optical Data Storage
- A Near-Field Recording and Readout Technology Using a Metallic Probe in an Optical Disk
- The Characteristics and the Potential of Super Resolution Near-Field Structure
- Double Optical Phase Transition of GeSbTe Thin Films Sandwiched between Two SiN Layers
- Electrical Properties of Nanometer-Width Refractory Metal Lines Fabricated by Focused Ion Beam and Oxide Resists