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Semiconductor Research Center Matsushita Electric Industrial Co. Lid. | 論文
- Plasma Ion-Doping Technique with 20 kHz Biased Electron Cyclotron Resonance Discharge : Techniques, Instrumentations and Measurement
- A Small Collector-Up AlGaAs/GaAs Heterojunction Bipolar Transistor Fabricated Using H^+ Implantation
- New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns (Special Issue on Quarter Micron Si Device and Process Technologies)
- Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- A New Photobleachable Positive Resist for KrF Excimer Laser Lithography : Advanced III-V Compound Semiconductors and Silicon Devices(Solid State Devices and Materials 1)
- A KrF Excimer Laser Lithography for Half Micron Devices : Techniques, Instrumentations and Measurement
- A New Analytical Technique for Evaluating Standing Wave Effect of Chemically Amplified Positive Resist
- Application of Photobleachable Positive Resist and contrast Enhancement Material to KrF Excimer Laser Lithography : Resist Material and Process
- Tunnel Structured Stacked Capacitor Cell (TSSC) with High Reliability for 64 Mbit dRAMs and Formation of Oxide-Nitride-Oxide Film (ONO) on 3-dimensionally (3d) Storage Electrode
- Doping of Trench Side-Walls Using an Arsenic Planar-Type Solid-Diffusion Source (S-D Source) and Analysis of Doping Uniformity by Secondary Ion Mass Spectroscoty (SIMS)
- An Npn AlGaAs/GaAs Collector-up HBT with an H^+ -Implanted High Resistivity Layer under the External p^+ -GaAs Base
- Photoluminescence of an InAlAs/InGaAs Quantum Well Structure Grown on a GaAs Substrate
- Lattice-Mismatched Growth and Transport Properties of InAlAs/InGaAs Heterostructures on GaAs Substrates
- In_Ga_As/InAlAs Modulation-doped Field Effect Transistors on GaAs Substrates Grown by Low-Temperature Molecular Beam Epitaxy
- Novel Silicon-Containing Negative Resist for Bilayer Application in Electron Beam Direct Writing
- Application of Photobleachable Positive Resist and Contrast Enhancement Material to KrF Excimer Laser Lithography
- Development Methods for Submicron Optical Lithography
- High-Aspect-Ratio Alkaline Surface Treatment Method of Dyed Photoresist