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Research Center for Integrated Systems, Hiroshima University | 論文
- Atomic Scale Morphology of Hydrogen-Termimated Si(100) Surfaces Studied by Fourier-Transform Infrared Attenuated Total Reflection Spectroscopy and Scanning Probe Microscopies
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- Single-Chip Integration of Light-Emitting Diode, Waveguide and Micrormirrors
- Fabrication and Evaluation of Three-Dimensional Optically Coupled Common Memory
- Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering
- Atomic Scale Flatness of Chemically Cleaned Silicon Surfaces Studied by Infrared Attenuated-Total-Reflection Spectroscopy
- BF^+_2 Ion Implantation into Very-Low-Temperature Si Wafer
- Chemical Stability of HF-Treated Si(111) Surfaces
- Chemical Bonding Features of Fluorine and Boron in BF^+_2 -Ion-Implanted Si
- Quantitative Analysis of Tunneling Current through Ultrathin Gate Oxides
- Quantitative Evaluation of Dopant Loss in 5-10 keV As Ion Implantation for Low-Resistive, Ultrashallow Source/Drain Formation
- An Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Experimental Pattern Recognition System Using Bidirectional Optical Bus Lines
- Optically Interconnected Kohonen Net for Pattern Recognition
- High-Efficiency Micromirrors and Branched Optical Waveguides on Si Chips
- New RAM-bus Memory System with Interchip Optical Interconnection
- Micron-Size Optical Waveguide for Optoelectronic Integrated Circuit
- Medium-Energy Ion Spectroscopy Using Ion Implanter
- New Ar-Plasma Cleaning Process for Reduction of Al/TiSi_2 Contact Resistance
- Determination of Valence Band Alignment at Ultrathin SiO_2/Si Interfaces by High-Resolution X-Ray Photoelectron Spectroscopy