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Nikon Corp. | 論文
- Defect Production in Phosphorus Ion-Implanted SiO_2(43 nm)/Si Studied by a Variable-Energy Positron Beam
- Optical Constants of BaF_2 and SrF_2
- Characterization of Separation-by-Implanted-Oxygen Wafers with Monoenergetic Positron Beams
- Simulation of Light Scattering by a Particle on a Film-Coated Substrate Using Coupled-Dipole Method
- Light Scattering by Submicron Particles on Film-Coated Wafers
- Adsorption and Desorption of Metallic Impurities on Si Wafer Surface in SC1 Solution
- Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
- Defects Introduced by MeV-Energy Ion Implantation into Si Probed by a Monoenergetic Positron Beam
- Effects of the Fermi Level on Defects in Be^+-Implanted GaAs Studied by a Monoenergetic Positron Beam
- Plasma Chemical Vaporization Machining (CVM) for Fabrication of Optics
- Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
- Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer(Instrumentation, Measurement, and Fabrication Technology)
- Superconducting Bi_2Sr_2Ca_1Cu_2O_ Glass-Ceramics with Different Melting Histories
- Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence
- Sample Preparation and Photoluminescence of ZnO Particles Embedded in Thin Alkali Halide Crystals
- Observation by video-enhanced microscopy of mitotic human chromosomes in a living cell(Abstracts of the 48th Annual Meeting of the Society of Chromosome Research)
- Contouring of polished single-crystal silicon plates by wire electrical discharge machining
- Ultraprecision 5-Axis Control Machining of Fly-Eye Mirror in EUV Lithography
- Visible Light Induced Hydrogen Evolution on CdS/K_4Nb_6O_ Photocatalyst
- Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography