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National Nano Device Lab. | 論文
- Pattern Effects on Planarization Efficiency of Cu Electropolishing
- Investigation of Carrying Agents on Microstructure of Electroplated Cu Films
- Investigation of Superfihling and Electrical Characteristics in Low-Impurity-Incorporated Cu Metallization
- Microwave Heating for the Preparation of Nanometer Gold Particles
- Synthesis of Nanometer-Sized Poly (methyl methacrylate) Polymer Network by Gold Nanoparticle Template
- Plasma Treatment and Dry Etch Characteristics of Organic Low-k Dielectrics
- Effects of Helicon-Wave-Plasma Etching on the Charging Damage of Aluminum Interconnects
- Charging Damages to Gate Oxides in a Helicon O_2 Plasma
- Antenna Charging Effects on the Electrical Characteristics of Polysilicon Gate during Electron Cyclotron Resonance Etching
- Effects of Polysilicon Electron Cyclotron Resonance Etching on Electrical Characteristics of Gate Oxides
- Impacts of LP-SiN Capping Layer and Lateral Diffusion of interface Trap on Hot Carrier Stress of NMOSFETs
- Application of Field-Induced Source/Drain Schottky Metal-Oxide-Semiconductor to Fin-Like Body Field-Effect Transistor : semiconductors
- Impact of Thermal Stability on the Characteristics of Complementary Metal Oxide Semiconductor Transistors with TiN Metal Gate
- The Combined Effects of Nitrogen Implantation at S/D Extension and N_2O Oxide on 0.18μm N- and P-Metal Oxide Field Effect Transistors (MOSEETs)
- The Effects of Shallow Germanium Halo Doping on N-Channel Metal Oxide Semiconductor Field Effect Transistors
- A Radiation-Hard Flash Cell Using Horn-Shaped Floating Gate and N_2O Annealing
- A Study on the Radiation Hardness of Flash Cell with Horn-Shaped Floating-Gate
- Effects of Floating-Gate Doping Concentration of Flash Cell Performance
- Characterization of Antenna Effect by Nondestructive Gate Current Measurement
- Combination of Chemical Mechanical Polishing and Ultrahigh Vacuum Chemical Vapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors