スポンサーリンク
National Institute of Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan | 論文
- Micromachined Silicon Disk Resonator Transduced by Piezoelectric Lead Zirconate Titanate Thin Films
- Fabrication and Characterization of Optical Micro-Electro-Mechanical System Scanning Devices Using BaTiO3-Based Lead-Free Piezoelectric-Coated Substrate Sheet by Aerosol Deposition
- UV Nanoimprint in Pentafluoropropane at a Minimal Imprint Pressure
- Fabrication processes for capacity-equalized mold with fine patterns (Special issue: Microprocesses and nanotechnology)
- Sensing Property of Self-Sensitive Piezoelectric Microcantilever Utilizing Pb(Zr0.52/Ti0.48)O3 Thin Film and LaNiO3 Oxide Electrode
- Effective Linewidth Measurement of 45-nm-Half-Pitch Ultraviolet Nanoimprint Lithography Patterns by Scanning Electron Microscope Inspection and Extremely Shallow Si Etching (Special Issue : Microprocesses and Nanotechnology)
- Theoretical and Simulated Analysis of Guided Waves Propagating in Fluid-Filled Pipes
- Effects of Environmental Gas in UV Nanoimprint on the Characteristics of UV-Curable Resin
- Evaluation of Viscosity Characteristics of Spin-Coated UV Nanoimprint Resin
- Evaluation of Dielectric Properties of Ferroelectric Fine Particles Fabricated by Focused Ion Beam Technique
- Theoretical and Experimental Investigation of Propagation of Guide Waves in Cylindrical Pipe Filled with Fluid
- Study on Quartz Multitier Mold Fabrication Using Gray Scale Laser Beam Lithography
- In-situ Evaluation of Air/Oxygen Percentage Variation by Introducing 1,1,1,3,3-Pentafluoropropane in Ultraviolet Nanoimprint Lithography
- Effects of Granularity of Complementary Patterns in a Capacity-Equalized Mold Used for UV Nanoimprint Lithography
- Fabrication and Evaluation of Lead-Free Piezoelectric Ceramic LF4 Thick Film Deposited by Aerosol Deposition Method
- Microelectromechanical Systems-Based Electrostatic Field Sensor Using Pb(Zr,Ti)O3 Thin Films
- Uniform Residual Layer Creation in Ultraviolet Nanoimprint Using Spin Coat Films for Sub-100-nm Patterns with Various Pattern Densities
- Control of Resin Filling and Pattern Quality of Ultraviolet Nanoimprint Lithography in Pentafluoropropane and Helium Ambient
- Piezoelectric Optical Micro Scanner with Built-in Torsion Sensors
- Uniform Residual Layer Creation in Ultraviolet Nanoimprint Using Spin Coat Films for Sub-100-nm Patterns with Various Pattern Densities (Special Issue : Microprocesses and Nanotechnology)