スポンサーリンク
Institute Of Microelectronics | 論文
- Work Function Modulation Using Thin Interdiffused Metal Layers for Dual Metal-Gate Technology
- Practical Solutions to Enhance EWF Tunability of Ni FUSI Gates on HfO_2
- Highly Manufacturable CMOSFETs with Single High-k (HfLaO) and Dual Metal Gate Integration Process
- CMOS Compatible Si-Nanowire Inverter Logic Gate for Low Power Applications
- Device Performance and Reliability Considerations of Biaxially Strained Si by Wafer-Bonding-Technology
- Electrical Sensing of Calcium Ions using Silicon Nanowire Array
- A Novel Approach to Fabricate-120nm Thick Fully Relaxed Ge-on-Insulator
- A Novel Dual-Metal Gate Integration Process for Sub-1nm EOT HfO_2 CMOS Devices
- Doping Effect of PtCu/Co and PtAl/Co Multilayers
- MOVPE Prepared ZnO/Si Heterojunction Diodes with Dual Functions : Light-Emission and UV Photo-Detection
- On the Hardening of Friction Stir Processed Mg-AZ31 Based Composites with 5-20% Nano-ZrO_2 and Nano-SiO_2 Particles
- Improving the Accuracy of Modified Shift-and-Ratio Channel Length Extraction Method Using Scanning Capacitance Microscopy
- Lasing from a One-Dimensional Photonic Crystal Made of Dye-Doped Holographic Polymer-Dispersed Liquid Crystal Gratings
- Memory Effect of Device Based on a Conjugated Donor-Acceptor Copolymer
- High quality Si_Ge_x nanowire and its application to MOSFET integrated with HfO_2/TaN/Ta gate stack
- Enhanced Thermal Stability of Nickel Germanide with Ultrathin Ti Layer
- Pt-germanide Formed by Laser Annealing and Its Application for Schottky Source/Drain MOSFET Integrated with TaN/CVD-HfO_2/Ge Gate Stack
- Design of I-Q down-converter in CMOS for wireless network application
- Pulsed Laser Irradiation of Silicon-Germanium-on-Insulator (Si_Ge_OI) Substrates for Strain Relaxation and Defect Reduction
- Strained SiGe-On-Insulator N-MOSFET with Silicon Source/Drain for Drive Current Enhancement