スポンサーリンク
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan | 論文
- Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma
- Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma (特集 量子ビームによるナノバイオエレクトロニクス)
- α_1-Acid Glycoprotein Suppresses Rat Acute Inflammatory Paw Edema through the Inhibition of Neutrophils Activation and Prostaglandin E_2 Generation(Pharmacology)
- Patterning on Cyanine-Dye-Doped Conductive Polymer Films by Ink Jet Method
- Fabrication of Back-Side Illuminated Complementary Metal Oxide Semiconductor Image Sensor Using Compliant Bump
- Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase
- Direct Etching of Poly(methyl methacrylate) Using Laser Plasma Soft X-rays
- Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge
- Numerical Simulation for Mechanism of Airway Narrowing in Asthma(Reviewed Papers Accepted for Publication in this Special Issue)(Special Issue on Bioengineering)
- Effect of Argon/Hydrogen Plasma Cleaning on Electroless Ni Deposition on Small-Area Al Pads
- Numerical Simulation for Mechanism of Airway Narrowing in Asthma
- Numerical Simulation for Mechanism of Airway Narrowing in Asthma
- Evaluation of Crystal Orientation for (K,Na)NbO Films Using X-ray Diffraction Reciprocal Space Map and Relationship between Crystal Orientation and Piezoelectric Coefficient
- Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH4+B10H14 Multi-Hollow Discharge Plasma Chemical Vapor Deposition
- Effect of Nitridation of Si Nanoparticles on the Performance of Quantum-Dot Sensitized Solar Cells
- Impact of Rapid Crystallization of Si Using Nickel-Metal-Induced Lateral Crystallization on Thin-Film Transistor Characteristics
- Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen-Mediated Crystallization
- Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition
- Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells
- High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition