Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells
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概要
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Quantum dots (QDs) based on multiple exciton generation have attracted much attention. They are capable of generating multiple electrons by single-photon absorption. Si is one of the good QD sources and its nontoxicity and abundance are advantageous for photovoltaics. In this work, Si QDs were fabricated by multihollow discharge plasma chemical vapor deposition, and they were applied to Si QD-sensitized solar cells. Their initial performance was poor because of the weak adhesion of Si and charge recombination. In this work, we solved these problems through the functionalization of Si QDs and a ZnO barrier. Functionalized Si QDs were more adsorbed on TiO2 with strengthened adhesion and the ZnO barrier prevented the contact between TiO2 and the redox electrolyte. Consequently, the improved adhesion and the reduced electron recombination led to the enhancement of overall photovoltaic characteristics.
- 2013-01-25
著者
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Koga Kazunori
Graduate School Of Information Science And Electrical Engineering Kyushu University
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Uchida Giichiro
Graduate School Of Advanced Sciences Of Matter Hiroshima University
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Shiratani Masaharu
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Itagaki Naho
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Sato Muneharu
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Seo Hyunwoong
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Kamataki Kunihiro
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Wang Yuting
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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