Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge
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概要
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The redox reaction between cystein and cystine is observed using radicals produced in water vapor plasma for the control of plant growth. Cystein is oxidized to cystine using the OH radical in the higher-pressure regime and cystine is reduced to cystein by the H radical generated in the lower-pressure regime. Also, the oxidative stress reaction of plants is observed when water vapor plasma is irradiated onto seeds of plants such as radish sprouts. The mechanism of the control of plant growth is explained by the change in thiol compound quantity of the plant cells induced by the radical reaction.
- 2011-08-25
著者
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Hayashi Nobuya
Faculty Of Science And Engineering Saga University
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Koga Kazunori
Graduate School Of Information Science And Electrical Engineering Kyushu University
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Shiratani Masaharu
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Nakahigashi Akari
Faculty of Science and Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan
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Goto Masaaki
Faculty of Medicine, Saga University, 5-1-1 Nabeshima, Saga 849-8501, Japan
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Kitazaki Satoshi
Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan
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Hayashi Nobuya
Faculty of Science and Engineering, Saga University, Saga 840-8502, Japan
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Nakahigashi Akari
Faculty of Science and Engineering, Saga University, Saga 840-8502, Japan
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