Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si

スポンサーリンク

概要

• 論文の詳細を見る

• The volume fraction of silicon clusters in amorphous silicon (a-Si:H) films has been investigated using specially designed quartz crystal microbalances (QCMs) together with optical emission spectroscopy (OES). The optical emission intensities of Si^*and SiH^*and their intensity ratios are selected for comparison with the QCM results. We show that the volume fraction of silicon clusters strongly correlates with not only the electron temperature but also the SiH^*intensity. This suggests that the ratios of Si^*/SiH^*and SiH^*can be used to predict the volume fraction of Si clusters in a-Si:H films.

• 2013-11-25

著者

• Koga Kazunori

  Graduate School Of Information Science And Electrical Engineering Kyushu University

• Kamataki Kunihiro

  Center For Research And Advancement In Higher Education Kyushu University

• Uchida Giichiro

  Graduate School Of Advanced Sciences Of Matter Hiroshima University

• Shiratani Masaharu

  Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Itagaki Naho

  Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Kim Yeonwon

  Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Hatozaki Kosuke

  Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Hashimoto Yuji

  Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

• Seo Hyunwoong

  Center of Plasma Nano-interface Engineering Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan

関連論文

• Propagation Characteristics of Ion Acoustic Waves in an Ar/SF_6 Plasma
• Highly Conducting and Very Thin ZnO:Al Films with ZnO Buffer Layer Fabricated by Solid Phase Crystallization from Amorphous Phase
• Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge
• Impacts of amplitude modulation of RF discharge voltage on the growth of nanoparticles in reactive plasmas
• Impacts of Amplitude Modulation of RF Discharge Voltage on the Growth of Nanoparticles in Reactive Plasmas
• Evaluation of Crystal Orientation for (K,Na)NbO Films Using X-ray Diffraction Reciprocal Space Map and Relationship between Crystal Orientation and Piezoelectric Coefficient
• Discharge Characteristics of Plasma Display Panels with SrCaO Protective Layer Manufactured Using "All-in-Vacuum" Process
• Improvement on the Long-Term Stability of Dye-Sensitized Solar Module by Structural Alternation (Special Issue : Photovoltaic Science and Engineering)
• Panel Processing Effects on Discharge Characteristics of Plasma Display Panels
• Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH4+B10H14 Multi-Hollow Discharge Plasma Chemical Vapor Deposition
• Effect of Nitridation of Si Nanoparticles on the Performance of Quantum-Dot Sensitized Solar Cells
• Effects of Hydrogen Dilution on ZnO Thin Films Fabricated via Nitrogen-Mediated Crystallization
• Combinatorial Deposition of Microcrystalline Silicon Films Using Multihollow Discharge Plasma Chemical Vapor Deposition
• Improvement of Si Adhesion and Reduction of Electron Recombination for Si Quantum Dot-Sensitized Solar Cells
• High Amount Cluster Incorporation in Initial Si Film Deposition by SiH4 Plasma Chemical Vapor Deposition
• Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells
• Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide
• Characteristics of Crystalline Silicon/Si Quantum Dot/Poly(3,4-ethylenedioxythiophene) Hybrid Solar Cells (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
• Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si
• Improvement on the Electron Transfer of Dye-Sensitized Solar Cell Using Vanadium Doped TiO
• Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si[*] and SiH[*] (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
• Effects of Nitrogen on Crystal Growth of Sputter-Deposited ZnO Films for Transparent Conducting Oxide (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)

もっと見る 閉じる

スポンサーリンク