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Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology | 論文
- Corrosion in Aluminum Chemical Mechanical Planarization for Sub-Quarter-Micron Dynamic Random Access Memory Devices
- Effect of Decarburization Heat Treatment and Chromium Addition on Intergranular Embrittlement of SA-106 Carbon Steel
- Low-Threshold-Current and Single-Mode Surface-Emitting Laser Buried in Amorphous GaAs
- Low Threshold Current Density Surface-Emitting Lasers Buried by Amorphous GaAs
- Thermal Stability and Electrical Properties of SrBi_2TaNb_XO_9/IrO_x Capacitors With Pt Top Electrode : Semiconductors
- Dielectric Properties and X-Ray Study of Zr-Sbustituted Pb(Yb_Nb_)O_3 Ceramics
- Structural Phase Transition in La-Substituted Pb[(Yb_Nb_)_Ti_]O_3 Relaxor System
- Effects of the Deposition Conditions of the Seed Layer on the Crystallinity and Electrical Characteristics of the Pb(Zr, Ti)O_3 Films
- Effect of Activation of Oxygen by Electron Cyclotron Resonance Plasma on the Incorporation of Pb in the Deposition of Pb(Zr,Ti)O_3 Films by DC Magnetron Reactive Sputtering
- Investigation of Pt/Ti Bottom Electrodes for Pb(Zr, Ti)O_3 Films
- Composition Control of Lead Zirconate Titanate Thin Films in Electron Cyclotron Resonance Plasma Enhanced Chemtical Vapor Deposition System
- Growth Kinetics of Cu-Sn Intermetallic Compounds at Interface of 80Sn-20Pb Electrodeposits and Cu Based Leadframe Alloy, and Its Influence on the Fracture Resistance to 90°-Bending
- Effect of Oxygen Plasma Treatment on Hydrogen-Damaged Pt/Pb(Zr_xTi_)O_3/Pt Ferroelectric Thin-Film Capacitor
- Decontamination of Building Surface Using Clay Suspension
- Simulation of Optical Constants Range of High-Transmittance Attenuated Phase-Shifting Masks Used in KrF Laser and ArF Laser
- Electrical Properties of CuPc Films Prepared by Plasma-Activated Evaporation in N_2 and NO_x Environments
- Annealing of RuO_2 and Ru Bottom Electrodes and Its Effects on the Electrical Properties of (Ba,Sr)TiO_3 Thin Films
- An Effective Load Balancing Scheme for 3D Texture-Based Sort-Last Parallel Volume Rendering on GPU Clusters
- Investigation of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using SiH_2Cl_2 and O_3 as the Precursors
- Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN