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Department Of Materials Science Kitami Institute Of Technology | 論文
- New Electrochemical Oscillations in Reduction Reactions on a Platinum Electrode in Hydrogen Peroxide Containing Sulfuric Acid Solutions
- メカニカルミリングした結晶化合物GdNにおけるspin-glass的振舞
- Conduction Properties of Incommensurate Misfit Layer Compounds (CeS)_(TiS_2)_n (n=1, 2)
- Variety of Magnetism in Incommensurate Misfit Layer Compounds (RES)_xTS_2 (RE=Rare Earths, T=Ta, V, Ti, Cr)
- Room-Temperature Self-Electrooptic Effects of GaAs/AlAs Asymmetric Coupled Quantum Wells
- Synergy of CoAl_2O_4 and Al_2O_3 in CoAl_2O_4-Al_2O_3 Catalysts for Selective Reduction of Nitrogen Monoxide with Ethene in Excess Oxygen
- CPM2000-82 (001)Si上(111)Cu/(111)HfN/(002)Hf三層膜の連続単配向成長に及ぼすHf膜厚の影響
- Al_3Zr金属間化合物膜の陽極酸化とそれを応用した高信頼性薄膜キャパシタの作製
- Alメタライゼーション系へのAl_3Hf/Hf積層膜の拡散バリヤとしての適用
- Al_3Hf金属間化合物膜の結晶化過程と電気的特性
- n-(001)Si上への単配向Hf膜の作製条件の検討
- 反応性スパッタリング法によるRuO_2薄膜の作製とその電気特性
- Al-Si間におけるAl_3Zr/Zr積層膜の拡散バリヤ効果について
- Study on Preparation Conditions of High-Quality ZrN Thin Films Using a Low-Temperature Process
- Preparation of Oxygern-Containing Pt and Pt Oxide Thin Films by Reactive Sputtering and Their Characterization
- Formation Process and Electrical Property of RuO_2 Thin Films Prepared by Reactive Sputtering
- Initial Silicide Formation Process of Single Oriented (002) Hf Film on Si and Its Diffusion Barrier Property
- A Study on the Preparation Conditions of Single Oriented (002) Hf Film on n-(001) Si
- Surface Oxidation Behavior of TiN Film Caused by Depositing SrTiO_3 Film
- Coherent Electron-Correlation Compatible with Random Atom Stacking in Amorphous Ce-Ru Alloys