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Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology | 論文
- Al_3Hf陽極酸化膜キャパシタの電気的特性と耐熱特性
- Sequential Single-Oriented Growth of(111)Cu/(111)HfN/(002)Hf Trilayered Film on(001)Si and Its Thermal Stability
- Application of HfN/Hf Bilayered Film as a Diffusion Barrier for Cu Metallization System of Si Large-Scale Integration
- A Comparative Study on the Effects of Nicotine and GTS : 21, a New Nicotinic Agonist, on the Locomotor Activity and Brain Monoamine Level
- Protective Effect of GTS-21, a Novel Nicotinic Receptor Agonist, on Delayed Neuronal Death Induced by Ischemia in Gerbils
- GTS-21, a Nicotinic Agonist, Protects against Neocortical Neuronal Cell Loss Induced by the Nucleus Basalis Magnocellularis Lesion in Rats
- Comparison of Microstructure and Ferroelectric Properties of Alkoxy-Derived MBi_4Ti_4O_ (M: Ca or Sr) Thin Films
- Preparation of Layer-Structured CaBi_2Ta_2O_9 Ferroelectric Thin Films through a Triple Alkoxide Route
- Al_3Zr金属間化合物膜の陽極酸化とそれを応用した高信頼性薄膜キャパシタの作製
- Al_3Hf金属間化合物膜の結晶化過程と電気的特性
- n-(001)Si上への単配向Hf膜の作製条件の検討
- 反応性スパッタリング法によるRuO_2薄膜の作製とその電気特性
- Study on Preparation Conditions of High-Quality ZrN Thin Films Using a Low-Temperature Process
- Preparation of Oxygern-Containing Pt and Pt Oxide Thin Films by Reactive Sputtering and Their Characterization
- Formation Process and Electrical Property of RuO_2 Thin Films Prepared by Reactive Sputtering
- Initial Silicide Formation Process of Single Oriented (002) Hf Film on Si and Its Diffusion Barrier Property
- A Study on the Preparation Conditions of Single Oriented (002) Hf Film on n-(001) Si
- Surface Oxidation Behavior of TiN Film Caused by Depositing SrTiO_3 Film
- Determination of Pb/(Zr+Ti) and Zr/(Zr+Ti) Ratios of Lead Zirconate Titanate Surface by X-Ray Photoelectron Spectroscopy
- Microstructure of Pb(Zr, Ti)O_3-Based Pyroelectric Ceramics HIPped with Glass Encapsulation