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Department Of Electronics And Communication Engineering School Of Science And Engineering Waseda Uni | 論文
- Molecular Mechanism of Inhibition by Lithium of Neuronal Differentiation of Rat PC12 Pheochromocytoma Cells (Proceedings of the 20th Symposium on Toxicology and Environmental Health)
- Enhancement/Depletion Surface Channel Field Effect Transistors of Diamond and Their Logic Circuits
- Method of Probe Measurement in N_2/SiH_4 Microwave Plasma
- Effect of Lithium on Neuronal Differentiation by Nerve Growth Factor (NGF) in PC12 Cells (Proceedings of the 19th Symposium on Toxicology and Environmental Health)
- A Mathematical Model for Anisotropic Properties of Ventricular Muscle
- Brain Activation during the Spot the Differences Game
- FOREWORD (Special Issue on Multimedia on Demand)
- Assessment of Renal Toxicity by Transepithelial Transport Activity in Cultured Renal Epithelial Cells (Proceedings of the 21st Symposium on Toxicology and Environmental Health)
- Microwave Plasma CVD System to Fabricate α-Si Thin Films out of Plasma
- Deposition of Hydrogenated Amorphous Silicon Films Using a Microwave Plasma Chemical Vapor Deposition Method with DC Bias
- Sum of Roots Characterization for H_2 Control Performance Limitations
- New Subhierarchies of the KP Hierarchy in the Sato Theory.I.Analysis of the Burgers-Hopf Hierarchy by Sato Theory
- Special Issue on Advanced Telecommunication Terminals
- A New Approach to Completely Integrable Partial Differential Equations by Means of the Singularity Analysis
- Fabrication of a-Si:H Thin Films Using a Microwave Discharge Under a Magnetic Field of Electron Cyclotron Resonance
- Removal Conditions of Films Deposited on Probe Surface
- Optical Energy Gap Measuremerut of Plasma Chemical Vapor Deposition Very Thin Films Using Evanescent Wave
- Dependence of Photoluminescence Characteristics of Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films on Ion Bombardment Energy
- Photoluminescence from Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films Fabricated by Double-Tubed-Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition System : Optics and Quantum Electronics
- Effect of HF Treatment on Photoluminescence Characteristics of a-Si:H Nanoball Films