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Central Research Lab. Hitachi Ltd. | 論文
- Dependence of CdZnSe/ZnMgSSe Laser Diode Operating Characteristics on Band Gap and Net Acceptor Concentration of p-Type Cladding Layer
- Observation of Magnetic Induction Distribution by Scanning Interference Electron Microscopy
- A New Method for Measurement of Micro-Defects near the Surface of Si Wafers : Optical Shallow Defect Analyzer (OSDA)
- A Novel Probe Size Measurement Method for a Fine Electron Beam
- Suppression of Hole Injection into the Tunnel Oxides of Flash Memories
- Phase-Hologram Fabrication with a Computer-Controlled Electron Beam
- A Low-Power Write Driver for Hard Disk Drives(Novel Device Architectures and System Integration Technologies)
- Reliability Study of C-Doped AlGaAs/GaAs Heterojunction Bipolar Transistors with Half-Micron-Wide Emitters
- Effects of Rapid Thermal Annealing on Bias-Stress-Induced Base Leakage in InGaP/GaAs Collector-Up Heterojunction Bipolar Transistors Fabricated with B Ion Implantation(High-Speed HBTs and ICs,Heterostructure Microelectronics with TWHM2005
- Semiconductor asymmetrically coupled waveguides for tunable dispersion compensation
- Modulation-Doped Multi-Quantum Well (MD-MQW) Lasers. : II. Experiment
- Monte Carlo Simulation for the Energy Dissipation Profiles of 5-20 keV Electrons in Layered Structures
- 1P218 The C-terminal extension specific to archaeal and eukaryotic DNA ligases modulates the DNA binding activity(7. Nucleic acid binding protein,Poster Session,Abstract,Meeting Program of EABS & BSJ 2006)
- Change of Apparent Sensitivity of an Electron Resist Due to Backing Materials
- Analysis of Chemical Amplification Resist Systems Using a Kinetic Model and Numerical Simulation : Resist Material and Process
- Electron Phase Counting Micromagnetometry Using a Differential Phase Contrast /Interference Scanning Transmission Electron Microscope
- Focused Ion Beam Induced Deposition in the High Current Density Region : Focused Ion Beam Process
- Focused Ion Beam Induced Deposition in the High Current Density Region
- Growth of Tungsten Film by Focused Ion Beam Induced Deposition
- Negative Resist for i-Line Lithography Utilizing Acid Catalyzed Silanol-Condensation Reaction