Roest David | ASM, Kapeldreef 75, B-3001 Leuven, Belgium
スポンサーリンク
概要
関連著者
-
Roest David
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
-
Vereecke Bart
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Herbert Struyf
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
-
Huffman Craig
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Verdonck Patrick
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
David De
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
-
Hessel Sprey
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
-
Nancy Heylen
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Steven Demuynck
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Patrick Verdonck
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Kristof Croes
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Hirofumi Arai
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
-
Noboru Takamure
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
-
Julien Beynet
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
-
Kiyohiro Matsushita
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
-
Nobuyoshi Kobayashi
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
-
Gerald Beyer
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Zsolt Tokei
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Baklanov Mikhail
imec, Kapeldreef 75, B-3001 Leuven, Belgium
-
Craig Huffman
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Bart Vereecke
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
-
Kobayashi Akiko
ASM, Tama, Tokyo 206-0025, Japan
-
Kobayashi Nobuyoshi
ASM, Tama, Tokyo 206-0025, Japan
-
Kimura Yosuke
ASM, Tama, Tokyo 206-0025, Japan
-
Matsushita Kiyohiro
ASM, Tama, Tokyo 206-0025, Japan
-
Besien Els
imec, Kapeldreef 75, 3001 Heverlee, Belgium
-
Vanstreels Kris
imec, Kapeldreef 75, 3001 Heverlee, Belgium
-
Trompoukis Christos
imec, Kapeldreef 75, 3001 Heverlee, Belgium
-
Urbanowicz Adam
imec, Kapeldreef 75, 3001 Heverlee, Belgium
-
Ishikawa Dai
ASM, Tama, Tokyo 206-0025, Japan
-
Nakano Akinori
ASM, Tama, Tokyo 206-0025, Japan
著作論文
- Influence of the UV cure on advanced plasma enhanced chemical vapour deposition low-k materials (Special issue: Advanced metallization for ULSI applications)
- Integration of Porogen-Based Low-$k$ Films: Influence of Capping Layer Thickness and Long Thermal Anneals on Low-$k$ Damage and Reliability
- Impact of Hydrocarbon Control in Ultraviolet-Assisted Restoration Process for Extremely Porous Plasma Enhanced Chemical Vapor Deposition SiOCH Films with k = 2.0 (Special Issue : Advanced Metallization for ULSI Applications)