Impact of Hydrocarbon Control in Ultraviolet-Assisted Restoration Process for Extremely Porous Plasma Enhanced Chemical Vapor Deposition SiOCH Films with k = 2.0 (Special Issue : Advanced Metallization for ULSI Applications)
スポンサーリンク
概要
著者
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Roest David
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
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Kobayashi Akiko
ASM, Tama, Tokyo 206-0025, Japan
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Kobayashi Nobuyoshi
ASM, Tama, Tokyo 206-0025, Japan
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Kimura Yosuke
ASM, Tama, Tokyo 206-0025, Japan
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Matsushita Kiyohiro
ASM, Tama, Tokyo 206-0025, Japan
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Ishikawa Dai
ASM, Tama, Tokyo 206-0025, Japan
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Nakano Akinori
ASM, Tama, Tokyo 206-0025, Japan
関連論文
- Influence of the UV cure on advanced plasma enhanced chemical vapour deposition low-k materials (Special issue: Advanced metallization for ULSI applications)
- Integration of Porogen-Based Low-$k$ Films: Influence of Capping Layer Thickness and Long Thermal Anneals on Low-$k$ Damage and Reliability
- Impact of Hydrocarbon Control in Ultraviolet-Assisted Restoration Process for Extremely Porous Plasma Enhanced Chemical Vapor Deposition SiOCH Films with k = 2.0 (Special Issue : Advanced Metallization for ULSI Applications)
- Plasma-Enhanced Atomic Layer Deposition Sealing Property on Extreme Low-k Film with k = 2.0 Quantified by Mass Metrology