Craig Huffman | IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
スポンサーリンク
概要
関連著者
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Huffman Craig
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Nancy Heylen
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Steven Demuynck
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Patrick Verdonck
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Kristof Croes
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Craig Huffman
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Vereecke Bart
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Herbert Struyf
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
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Herbert Struyf
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Demuynck Steven
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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David De
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
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David De
ASM Belgium, Kapeldreef 75, B-3001, Belgium
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Hessel Sprey
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
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Hessel Sprey
ASM Belgium, Kapeldreef 75, B-3001, Belgium
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Claes Martine
IMEC, 75 Kapeldreef, 3001 Leuven, Belgium
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Martine Claes
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Henny Volders
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Kristof Kellens
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Samuel Suhard
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Janko Versluijs
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Guy Vereecke
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Julien Beynet
ASM Belgium, Kapeldreef 75, B-3001, Belgium
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Gerald P.
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Roest David
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
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Hirofumi Arai
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
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Noboru Takamure
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
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Julien Beynet
ASM, Kapeldreef 75, B-3001 Leuven, Belgium
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Kiyohiro Matsushita
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
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Nobuyoshi Kobayashi
ASM, 23-1 Nagayama 6-chome, Tama, Tokyo 206-0025, Japan
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Gerald Beyer
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Zsolt Tokei
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Bart Vereecke
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
著作論文
- Integration and Dielectric Reliability of 30 nm Half Pitch Structures in Aurora\textregistered LK HM
- Integration of Porogen-Based Low-$k$ Films: Influence of Capping Layer Thickness and Long Thermal Anneals on Low-$k$ Damage and Reliability