De Gendt | Imec Kapeldreef
スポンサーリンク
概要
関連著者
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De Gendt
Imec Kapeldreef
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Roussel Ph.
Imec Kapeldreef
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DEGRAEVE R.
IMEC
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KAUERAUF T.
IMEC, Kapeldreef
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DE GENDT
IMEC, Kapeldreef
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Degraeve R.
Imec Kapeldreef
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Kauerauf T.
Imec Kapeldreef
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Groeseneken G.
Imec And Also At Ku
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Ragnarsson L-a.
Imec Kapeldreef
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GROESENEKEN G.
IMEC
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KAUERAUF T.
IMEC
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ZAHID M.
John Moores University Liverpool
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BRUNCO D.
Intel assignee at IMEC
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DE GENDT
IMEC
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CHO M.
IMEC, Kapeldreef
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Kaczer B.
Imec Kapeldreef
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Mertens P
Interuniversity Microelectronics Center
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Depas Michel
Imec Vzw
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Heyns M
Interuniv. Microelectronics Center Leuven Bel
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Gendt Stefan
Imec Vzw
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KNOTTER D.
Philips Research
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KENIS Karine
IMEC vzw
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MEURIS Marc
IMEC vzw
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MERTENS Paul
IMEC vzw
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HEYNS Marc
IMEC vzw
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CARTIER E.
IBM Semiconductor Research and Development Center
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CHO M.
IMEC
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KACZER B.
IMEC
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GROESENEKEN G.
IMEC, Kapeldreef
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DEGRAEVE R.
IMEC, Kapeldreef
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RAGNARSSON L-A.
IMEC, Kapeldreef
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KACZER B.
IMEC, Kapeldreef
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ROUSSEL Ph.
IMEC, Kapeldreef
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CRUPI F.
University of Calabria
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HOUSSA M.
IMEC
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KWAK D.
Samsung Electronics c/o IMEC
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KERBER A.
Infineon Technologies
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AUTRAN J.
University of Provence
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POURTOIS G.
IMEC
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PANTISANO L.
IMEC
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HEYNS M.
IMEC
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Heyns M.
Imec Vzw
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De Gendt
Imec Vzw
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Cartier E.
Ibm
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NIWA M.
Matsushita Electric Industrial Co., Ltd.
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MITSUHASHI R.
Matsushita assignee at IMEC
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YAMAMOTO K.
Matsushita assignee at IMEC
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HAYASHI S.
Semiconductor Company, Matsushita Electric Ind., Co., Ltd.
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HARADA Y.
Semiconductor Company, Matsushita Electric Ind., Co., Ltd.
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ROTHCHILD A.
IMEC vzw
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HOFFMANN T.
IMEC vzw
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KUBICEK S.
IMEC vzw
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BIESEMANS S.
IMEC vzw
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KUBOTA M.
Semiconductor Company, Matsushita Electric Ind., Co., Ltd.
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Niwa M.
Matsushita Electric Industrial Co. Ltd.
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Mitsuhashi R.
Matsushita Ltd.
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Knotter D.Martin
Philips Research
著作論文
- Impact of Organic Contamination on Thin Gate Oxide Quality
- Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks
- Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks
- Reliability Issues in High-k Stacks
- Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application