Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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Heyns M.
Imec Vzw
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De Gendt
Imec Kapeldreef
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De Gendt
Imec Vzw
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NIWA M.
Matsushita Electric Industrial Co., Ltd.
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MITSUHASHI R.
Matsushita assignee at IMEC
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YAMAMOTO K.
Matsushita assignee at IMEC
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HAYASHI S.
Semiconductor Company, Matsushita Electric Ind., Co., Ltd.
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HARADA Y.
Semiconductor Company, Matsushita Electric Ind., Co., Ltd.
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ROTHCHILD A.
IMEC vzw
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HOFFMANN T.
IMEC vzw
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KUBICEK S.
IMEC vzw
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BIESEMANS S.
IMEC vzw
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KUBOTA M.
Semiconductor Company, Matsushita Electric Ind., Co., Ltd.
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Niwa M.
Matsushita Electric Industrial Co. Ltd.
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Mitsuhashi R.
Matsushita Ltd.
関連論文
- Impact of Organic Contamination on Thin Gate Oxide Quality
- Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks
- Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks
- Reliability Issues in High-k Stacks
- Study of Dopant Diffusion and Defect Evolution for Advanced Ultra Shallow Junctions based on Atomistic Modeling
- Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application
- Oxygen-Vacancy-Induced V_t shift in La-containing Devices
- Phase and Composition Control of Ni-FUSI gates by N_2 I/I with Double Ni-silicidation