Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks

スポンサーリンク

概要

• 論文の詳細を見る
• 2006-09-13

著者

• Roussel Ph.

  Imec Kapeldreef

• Ragnarsson L-a.

  Imec Kapeldreef

• GROESENEKEN G.

  IMEC

• DEGRAEVE R.

  IMEC

• KAUERAUF T.

  IMEC

• CHO M.

  IMEC

• ZAHID M.

  John Moores University Liverpool

• BRUNCO D.

  Intel assignee at IMEC

• KACZER B.

  IMEC

• DE GENDT

  IMEC

• KAUERAUF T.

  IMEC, Kapeldreef

• CHO M.

  IMEC, Kapeldreef

• DE GENDT

  IMEC, Kapeldreef

• De Gendt

  Imec Kapeldreef

• Kaczer B.

  Imec Kapeldreef

• Degraeve R.

  Imec Kapeldreef

• Kauerauf T.

  Imec Kapeldreef

• Groeseneken G.

  Imec And Also At Ku

関連論文

• Impact of Organic Contamination on Thin Gate Oxide Quality
• Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks
• Degradation and Breakdown of Sub-1nm EOT HfO_2/Metal Gate Stacks
• Reliability Issues in High-k Stacks
• Feasibility analysis of direct tunneling through medium-κ dielectrics for embedded RAM applications
• Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application
• Characteristics and Correlated Fluctuations of the Gate and Substrate Current after Oxide Soft-Breakdown
• Oxygen-Vacancy-Induced V_t shift in La-containing Devices

スポンサーリンク