TAKAHASHI Kensuke | System Devices Research Laboratories, NEC Corporation

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概要

• TAKAHASHI Kensukeの詳細を見る
• 同名の論文著者
• System Devices Research Laboratories, NEC Corporationの論文著者

関連著者

• WATANABE Heiji

  System Devices Research Laboratories, NEC Corporation

• TATSUMI Toru

  System Devices Research Laboratories, NEC Corporation

• Watanabe Heiji

  System Devices Research Laboratories Nec Corporation

• TAKAHASHI Kensuke

  System Devices Research Laboratories, NEC Corporation

• MANABE Kenzo

  System Devices Research Laboratories, NEC Corporation

• MORIOKA Ayuka

  System Devices Research Laboratories, NEC Corporation

• IKARASHI Taeko

  System Devices Research Laboratories, NEC Corp.

• Yoshihara Takuya

  System Devices Research Laboratories Nec Corporation

• Tatsumi Toru

  System Devices Research Laboratories Nec Corporation

• Morioka Ayuka

  System Devices Research Laboratories Nec Corporation

• Takahashi Kensuke

  System Devices Research Laboratories Nec Corporation

• Tatsumi Toru

  System Devices And Fundamental Research Nec Corporation

• Manabe Kenzo

  System Devices Research Laboratories Nec Corporation

• Watanabe Hirohito

  System Devices Research Laboratories Nec Corp.

• Ikarashi Taeko

  System Devices Research Laboratories Nec Corporation

• Manabe Katsuya

  System Devices Research Laboratories Nec Corporation

• WATANABE Hirohito

  System Devices Research Laboratories, NEC Corporation

• IKARASHI Nobuyuki

  System Devices Research Laboratories, NEC Corporation

• HASE Takashi

  System Devices Research Laboratories, NEC Corporation

• OSHIDA Makiko

  System Devices Research Laboratories, NEC Corporation

• Hase Takashi

  System Devices Research Laboratories Nec Corporation

• Oshida Makiko

  System Devices Research Laboratories Nec Corporation

• IKARASHI Nobuyuki

  NEC Corporation, Device Platforms Research Laboratories

• Ikarashi N

  Nec Corporation Device Platforms Research Laboratories

• Ikarashi Nobuyuki

  System Devices Research Laboratories Nec Corporation

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著作論文

• High-Mobility Dual Metal Gate MOS Transistors with High-k Gate Dielectrics
• Fully Silicided NiSi Gate Electrodes on HfSiON Gate Dielectrics for Low-Power Applications
• High Mobility Dual Metal Gate MOS Transistors with High-k Gate Dielectrics
• Fully Silicided NiSi Gates on HfSiON Gate Dielectrics for Low Power Application
• Analysis of the Origin of the Threshold Voltage Change Induced by Impurity in Fully Silicided NiSi/SiO_2 gate stacks

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