OHUCHI Kazuya | System LSI Research & Development Center, Toshiba Corporation Semiconductor Company
スポンサーリンク
概要
関連著者
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OHUCHI Kazuya
System LSI Research & Development Center, Toshiba Corporation Semiconductor Company
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TSUCHIAKI Masakatsu
Corporate Research & Development Center, Toshiba Corporation
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Ohuchi Kimihiro
System Lsi Research & Development Center Semiconductor Company Toshiba Corporation
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HONGO Chie
Corporate Research & Development Center, Toshiba Corporation
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Hongo Chie
Corporate Research & Development Center Toshiba Corporation
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MURAKOSHI Atsushi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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SUGURO Kyoichi
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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Toyoshima Yasutake
Electrotechnical Labotatory
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Toyoshima Yoshiaki
System Lsi Research & Development Center Toshiba Corporation Semiconductor Company
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Toyoshima Yoshiaki
Semiconductor Device Engineering Laboratory Toshiba Corporation
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ADACHI Kanna
System LSI Research & Development Center, Toshiba Corporation Semiconductor Company
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HOKAZONO Akira
System LSI Research & Development Center, Toshiba Corporation Semiconductor Company
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KANEMURA Takahisa
System LSI Research & Development Center, Toshiba Corporation Semiconductor Company
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AOKI Nobutoshi
System LSI Research & Development Center, Toshiba Corporation Semiconductor Company
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NISHIGOHRI Masahito
Advanced Logic Technology Department, Toshiba Corporation Semiconductor Company
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Adachi Kanna
System Lsi Research & Development Center Toshiba Corporation Semiconductor Company
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Ohuchi Kazuya
System Lsi Research & Development Center Toshiba Semiconductor Company
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Ouchi Kiyoshi
Central Research Laboratory Hitachi Ltd.
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Aoki Nobutoshi
System Lsi Research & Development Center Toshiba Corporation Semiconductor Company
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Hokazono Akira
System Lsi Research & Development Center Toshiba Corporation Semiconductor Company
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Suguro K
Toshiba Corporation Semiconductor Company
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Suguro Kyoichi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Takashima Akira
Corporate Research & Development Center Toshiba Corporation
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Nishigohri Masahito
Advanced Logic Technology Department Toshiba Corporation Semiconductor Company
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Murakoshi A
Toshiba Corp. Yokohama Jpn
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Murakoshi Atsushi
Process And Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Tsuchiaki Masakatsu
Corporate Research & Development Center Toshiba Corporation
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Nishiyama Akira
Corporate Research & Development Center Toshiba Corporation
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Suguro Kyoichi
Toshiba Corporation Semiconductor Company
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Murakoshi Atsushi
Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
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Ohuchi Kazuya
System LSI Research & Development Center, Semiconductor Company, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
著作論文
- Ultrashallow Junction Formation for Sub-100nm Complementary Metal-Oxide-Semiconductor Field-Effect Transistor by Controlling Transient Enhanced Diffusion
- Intrinsic Junction Leakage Generated by Cobalt In-Diffusion during CoSi_2 Formation
- Intrinsic Junction Leakage by Co In-Diffusion during CoSi_2 Formation Characterized with Damage Free n+/p Silicon Diodes
- Junction Leakage Generation by NiSi Thermal Instability Characterized Using Damage-Free n+/p Silicon Diodes
- Suppression of Thermally Induced Leakage of NiSi-Silicided Shallow Junctions by Pre-Silicide Fluorine Implantation