Hongo Chie | Corporate Research & Development Center Toshiba Corporation
スポンサーリンク
概要
関連著者
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OHUCHI Kazuya
System LSI Research & Development Center, Toshiba Corporation Semiconductor Company
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Ohuchi Kimihiro
System Lsi Research & Development Center Semiconductor Company Toshiba Corporation
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TSUCHIAKI Masakatsu
Corporate Research & Development Center, Toshiba Corporation
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HONGO Chie
Corporate Research & Development Center, Toshiba Corporation
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Hongo Chie
Corporate Research & Development Center Toshiba Corporation
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Takashima Akira
Corporate Research & Development Center Toshiba Corporation
著作論文
- Intrinsic Junction Leakage Generated by Cobalt In-Diffusion during CoSi_2 Formation
- Junction Leakage Generation by NiSi Thermal Instability Characterized Using Damage-Free n+/p Silicon Diodes