Sakamoto Kunihiro | National Institute Of Advanced Industrial Science And Technology (aist)
スポンサーリンク
概要
関連著者
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Sakamoto Kunihiro
National Institute Of Advanced Industrial Science And Technology (aist)
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LIU Yongxun
National Institute of Advanced Industrial Science and Technology
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MATSUKAWA Takashi
National Institute of Advanced Industrial Science and Technology
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YAMAUCHI Hiromi
National Institute of Advanced Industrial Science and Technology
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ISHIKAWA Yuki
National Institute of Advanced Industrial Science and Technology
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Endo Kazuhiko
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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Ogura Atsushi
School Of Science And Engineering Meiji University
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Tsukada Junichi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Hayashida Tetsuro
School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan
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MASAHARA Meishoku
National Institute of Advanced Industrial Science and Technology
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Kamei Takahiro
School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan
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ISHII Kenichi
National Institute of Advanced Industrial Science and Technology
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Huda Md.
National Institute Of Advanced Industrial Science And Technology (aist)
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SUZUKI Eiichi
National Institute of Advanced Industrial Science and Technology
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Miki Kazushi
National Institute Of Materials Science (nims)
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Fukatsu Susumu
Graduate School Of Arts And Sciences The University Of Tokyo
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NITTOH Koh-ichi
National Institute of Materials Science (NIMS)
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Yasutake Yuhsuke
Graduate School Of Arts And Sciences The University Of Tokyo
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Yamauchi Hiromi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Masahara Meishoku
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Masahara Meishoku
School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan
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Sakamoto Kunihiro
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Ishikawa Yuki
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Murata Koichi
National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan
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Endo Kazuhiko
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Miki Kazushi
National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan
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Nittoh Koh-ichi
National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan
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Huda Md.
National Institute Of Informatics(nii)
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FUKATSU Susumu
Graduate School of Arts and Sciences, The University of Tokyo
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MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
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MIKI Kazushi
Nanotechnology Research Institute-AIST
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MIKI Kazushi
Electrotechnical Laboratory (ETL)
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Miki K
Electrotechnical Laboratory (etl)
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Miki Kazushi
Aist
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Miki Kazushi
Nanoarchitecture Group Organic Nanomaterials Center National Institute For Materials Science
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Koyano Tamotsu
Cryogenics Center Univ. Of Tsukuba
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MURATA Koichi
National Institute of Materials Science (NIMS)
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YASUTAKE Yuhsuke
Graduate School of Arts and Sciences, The University of Tokyo
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Matsukawa Takashi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Tsukada Junichi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Yamauchi Hiromi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Masahara Meishoku
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Sakamoto Kunihiro
National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Sakamoto Kunihiro
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Liu Yongxun
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Liu Yongxun
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Matsukawa Takashi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Suzuki Eiichi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Yasutake Yuhsuke
Graduate School of Arts and Sciences, The University of Tokyo, Meguro, Tokyo 153-8902, Japan
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Neumann Peter
National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan
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Fukatsu Susumu
Graduate School of Arts and Sciences, The University of Tokyo, Meguro, Tokyo 153-8902, Japan
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Neumann Péter
National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan
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O'uchi Shinich
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Ogura Atsushi
School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki 214-8571, Japan
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Ogura Atsushi
School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan
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Hayashida Tetsuro
School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan
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Ishikawa Yuki
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Guo Ruofeng
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
著作論文
- Self-Aligned Planar Double-Gate Field-Effect Transistors Fabricated by a Source/Drain First Process
- Hybrid Laser Activation of Highly Concentrated Bi Donors in Wire-δ-Doped Silicon
- Experimental Study of Physical-Vapor-Deposited Titanium Nitride Gate with An n+-Polycrystalline Silicon Capping Layer and Its Application to 20 nm Fin-Type Double-Gate Metal--Oxide--Semiconductor Field-Effect Transistors
- A Comparative Study of Nitrogen Gas Flow Ratio Dependence on the Electrical Characteristics of Sputtered Titanium Nitride Gate Bulk Planar Metal–Oxide–Semiconductor Field-Effect Transistors and Fin-Type Metal–Oxide–Semiconductor Field-Effect Transistors
- Nitrogen Gas Flow Ratio and Rapid Thermal Annealing Temperature Dependences of Sputtered Titanium Nitride Gate Work Function and Their Effect on Device Characteristics
- Experimental Study of Floating-Gate-Type MetalOxideSemiconductor Capacitors with Nanosize Triangular Cross-Sectional Tunnel Areas for Low Operating Voltage Flash Memory Application (Special Issue : Microprocesses and Nanotechnology)
- Fabrication and Characterization of NOR-Type Tri-Gate Flash Memory with Improved Inter-Poly Dielectric Layer by Rapid Thermal Oxidation (Special Issue : Microprocesses and Nanotechnology)
- Characterization of Highly Concentrated Bi Donors Wire-\delta-Doped in Si
- Fabrication of Floating-Gate-Type Fin-Channel Double- and Tri-Gate Flash Memories and Comparative Study of Their Electrical Characteristics
- Self-Aligned Planar Double-Gate Field-Effect Transistors Fabricated by a Source/Drain First Process
- Gate Structure Dependence of Variability in Polycrystalline Silicon Fin-Channel Flash Memories
- Gate Structure Dependence of Variability in Polycrystalline Silicon Fin-Channel Flash Memories (Special Issue : Microprocesses and Nanotechnology)